徳光 永輔 (TOKUMITSU, Eisuke)教授
マテリアルサイエンス系,応用物理学領域
◆学位
博士(工学) 東京工業大学
◆職歴
2007 - : 東京工業大学精密工学研究所 , 准教授
2004 - : 東京工業大学精密工学研究所 , 助教授
2002 - : 東北大学電気通信研究所助教授
1992 - : 東京工業大学 助教授
1988 - : AT&T Bell Laboratories Member of Technical Staff
1987 - : 東京工業大学 助手
◆専門分野
固体電子工学、電子デバイス、半導体デバイス、電子材料、デバイスプロセス技術、パワーデバイス
◆研究課題
液体原料による革新的電子デバイス作製プロセス 不揮発性メモリ 薄膜トランジスタ パワーデバイス グラフェントランジスタ

■研究業績

◆発表論文
Electrical and patterning properties of direct nanoimprinted indium oxide (In2O3) and indium tin oxide (ITO)
Jain Puneet, Su Chang, Haga Ken-ichi, Tokumitsu Eisuke
JAPANESE JOURNAL OF APPLIED PHYSICS, 58, -, 2019/06/01
Direct imprinting of indium-tin-oxide precursor gel and simultaneous formation of channel and source/drain in thin-film transistor
Haga Ken-ichi, Kamiya Yuusuke, Tokumitsu Eisuke
JAPANESE JOURNAL OF APPLIED PHYSICS, 57, 2, -, 2018/02
Evaluation of (Bi,La)(4)Ti3O12 Thin Film for Capacitor-Type Synapses
2018 IEEE INTERNATIONAL MEETING FOR FUTURE OF ELECTRON DEVICES, KANSAI (IMFEDK), -, 2018
Investigation of Nb-Zr-O Thin Film using Sol-gel Coating
Kim Joonam, Haga Ken-ichi, Tokumitsu Eisuke
JOURNAL OF SEMICONDUCTOR TECHNOLOGY AND SCIENCE, 17, 2, 245-251, 2017/04
Fabrication of MoS2 thin films on oxide-dielectric-covered substrates by chemical solution process
Kim Joonam, Higashimine Koichi, Haga Ken-ichi, Tokumitsu Eisuke
PHYSICA STATUS SOLIDI B-BASIC SOLID STATE PHYSICS, 254, 2, -, 2017/02
◆Misc
Evaluation of (Bi, La)4Ti3012 Thin Film for Capacitor-Type Synapses
Yuta Miyabe, Isato Ogawa, Mutsumi Kimura, Eisuke Tokumitsu, Kenichi Haga, Isao Horiuchi
IMFEDK 2018 - 2018 International Meeting for Future of Electron Devices, Kansai, -, 2018/12/19
Oxide-channel ferroelectric-gate thin film transistors prepared by solution process
Eisuke Tokumitsu, Tatsuya Shimoda
Proceedings of the International Display Workshops, 1, 71-74, 2015/01/01
Preface
Panagiotis Dimitrakis, Yoshihisa Fujisaki, Guohan Hu, Eisuke Tokumitsu
Materials Research Society Symposium Proceedings, 1729, -, 2015/01/01
A study on graphitization of 4H-SiC(0001) surface under low pressure oxygen atmosphere and effects of pre-oxidation treatment
Yuichi Nagahisa, Yoshishige Tsuchiya, Eisuke Tokumitsu
Materials Science Forum, 821-823, 949-952, 2015/01/01
Kelvin probe force microscopy study on operating In-Sn-O-channel ferroelectric-gate thin-film transistors
P. T. Tue, T. Miyasako, E. Tokumitsu, T. Shimoda
Journal of Applied Physics, 115, -, 2014/03/14
◆書籍
Applications of Oxide Channel Ferroelectric-Gate Thin Film Transistors
Eisuke Tokumitsu and Tatsuya Shimoda, , “Ferroelectric-Gate Field Effect Transistor Memories”, Springer, 2016., 2016
Oxide-Channel Ferroelectric-Gate Thin Film Transistors with Nonvolatile Memory Function
Eisuke Tokumitsu, “Ferroelectric-Gate Field Effect Transistor Memories”,Springer, 2016., 2016
Materials and physics for nonvolatile memories II : spring 2010, April 5-9, San Francisco, California, U.S.A.
Materials Research Society. Spring Meeting, Materials and Physics for Nonvolatile Memories, Bonafos Caroline, Fujisaki Yoshihisa, Dimitrakis Panagiotis, 徳光 永輔, Materials Research Society, 9781605112275, 2010
電子物性・材料の事典
朝倉書店, 2006
◆講演・口頭発表
Chemical solution processed MoS2 on high-k oxide film
Joonam Kim, Kenichi Haga, Koichi Higashimine, Eisuke Tokumitsu
77回応用物理学会秋季学術講演会、13p-A37-2、朱鷺メッセ、2016-9.13-16, 2016., 2017
溶液プロセスによるMoS2の作製と薄膜トランジスタ応用に関する研究
金 胄男, 羽賀 健一, 徳光 永輔
第64回応用物理学会春季学術講演会、16a-F203-10、パシフィコ横浜、2017年3月14日~17日, 2017
強誘電体の特異物性と強誘電体ゲートデバイスの展望
徳光 永輔
電子情報通信学会2017年総合大会、エレクトロニクスソサイエティープレナリーセッション(CK-1) 2017年3月22~25日、名城大学 天白キャンパス(名古屋市), 2017
Fabrication of MoS2 thin films on oxide-dielectric-covered substrates
Joonam Kim and Eisuke Tokumitsu
Compound Semiconductor Week, June 26-30, 2016 Toyama International Conference Center, Toyama paper MoP-ISCS-121, 2017
Investigation of Nb-Zr-O thin film using sol-gel coating
J. Kim, K. Haga, E. Tokumitsu
82016 Asia-Pacific Workshop on Fundamentals and Applications of Advanced Semiconductor Devices (AWAD2016), paper B3-3(oral) July 4 - 6, 2016Hakodate Kokusai Hotel, Hakodate, Japan, 2017

■担当講義

デバイス物理特論, 先端デバイス特論(E)

■学外活動

◆所属学会
IEEE, 電子情報通信学会, 応用物理学会, Materials Research Society
◆学術貢献活動
Japan-Korea Joint Symposium, Recent progress and future prospects of functional 2-dimensional materials , 2016/03/19 , Tokyo Institute of Technology. O-okayama, Tokyo
The 5th International Symposium on Organic and Inorganic Electronic Materials and Related Nanotechnologies , 2015/06/16 - 2015/06/19 , TOKI MESSE Niiigata Convention Center, Niigata, Japan
2014 Fall Meeting of Materials Research Society, Sympoisum M Materials and Technlogies for Non-volatile Memories , 2014/11/30 - 2014/12/05 , Hynes Convention Center, Boston, USA